AFM Analysis of Surfaces
The most common application of atomic-force microscopy is in the high-resolution imaging of surface topography. Polished surfaces can be characterized by their roughness value - a measurable quantity calculated from AFM images of the surface topography. Surface topography can be created by many different processes, such as heat treatment, chemical etching, plasma treatment, ion bombardment, and UV exposure. Industrial processes can create scratches and embed particulate contaminants which degrade performance or mar appearances. Often, specific surface topography is created by lithographic techniques for the production of devices, gratings, etc. Characterization via AFM is important when surface features are expected to have nanometer dimensions.
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